Tadashi Nagayama
at Nikon Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Wafer-level optics, Monochromatic aberrations, Deep ultraviolet, Scanners, Reflectivity, Wavefront aberrations, Objectives, Optical alignment, Semiconducting wafers, Optics manufacturing

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Microscopes, Monochromatic aberrations, Spatial frequencies, Reflectivity, Image analysis, Optical alignment, Neodymium, Semiconducting wafers, Phase shifts, Chemical mechanical planarization

PROCEEDINGS ARTICLE | July 30, 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Diffraction, Reticles, Detection and tracking algorithms, Sensors, Reflectivity, Distortion, Optical alignment, Algorithm development, Semiconducting wafers, Chemical mechanical planarization

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