Tadatoshi Tomita
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 1 April 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Optical lithography, Polymethylmethacrylate, Polymers, Error analysis, Computer simulations, Numerical analysis, Directed self assembly, Double patterning technology, Picosecond phenomena, Critical dimension metrology

Proceedings Article | 20 March 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Polymethylmethacrylate, Etching, Image processing, Manufacturing, Ecosystems, Line width roughness, Directed self assembly, Line edge roughness, Semiconducting wafers

Proceedings Article | 19 March 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Polymethylmethacrylate, Polymers, Particles, Error analysis, Computer simulations, Data acquisition, Directed self assembly, Picosecond phenomena, Critical dimension metrology, Tolerancing

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Wafer-level optics, Optical lithography, Defect detection, Inspection, Scanning electron microscopy, Wafer inspection, Directed self assembly, Epitaxy, Semiconducting wafers, Defect inspection

Proceedings Article | 28 March 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Polymethylmethacrylate, Particles, 3D modeling, Scanning electron microscopy, Monte Carlo methods, Photomasks, Directed self assembly, Picosecond phenomena, Scanning transmission electron microscopy

Showing 5 of 13 publications
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