Dr. Tae Bong Eom Profile

Dr. Tae Bong Eom

at KRISS

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Author

Publications (14)

Proceedings Article | 13 May 2013 Paper

Tape measuring system using linear encoder and digital camera

Tae Bong Eom, Don Young Jeong, Myung Soon Kim, Jae Wan Kim, Jong Ahn Kim

Proceedings Volume 8788, 87883P (2013) https://doi.org/10.1117/12.2020470

KEYWORDS: Computer programming, Calibration, Imaging systems, Optical microscopes, Digital cameras, CCD cameras, Tablets, Interferometers, Aluminum, Distance measurement

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We have designed and constructed the calibration system of line standards such as tape and rule for the secondary calibration laboratories. The system consists of the main body with linear stage and linear encoder, the optical microscope with digital camera, and the computer. The base of the system is a aluminum profile with 2.9 m length, 0.09 m height and 0.18 m width. The linear stage and the linear encoder are fixed on the aluminum profile. The micro-stage driven by micrometer is fixed on the carriage of the long linear stage, and the optical microscope with digital camera and the tablet PC are on the this stage. The linear encoder counts the moving distance of the linear stage with resolution of 1 μm and its counting value is transferred to the tablet PC. The image of the scale mark of the tape is captured by the CCD camera of optical microscope and transferred to the PC through USB interface. The computer automatically determines the center of the scale mark by image processing technique and at the same time reads the moving distance of the linear stage. As a result, the computer can calculate the interval between the scale marks of the tape. In order to achieve the high accuracy, the linear encoder should be calibrated using the laser interferometer or the rigid steel rule. This calibration data of the linear encoder is stored at the computer and the computer corrects the reading value of the linear encoder. In order to determine the center of the scale mark, we use three different algorithms. First, the image profile over specified threshold level is fitted in even order polynomial and the axis of the polynomial is used as the center of the line. Second, the left side and right side areas at the center of the image profile are calculated so that two areas are same. Third, the left and right edges of the image profile are determined at every intensity level of the image and the center of the graduation is calculated as an average of the centers of the left and right edges at all intensity levels. The system can measure the line standards up to 2.5 m. The expanded uncertainty for the tape calibration is U = [(0.04)²+ (0.015•L)²]^1/2 mm, where L is measured length of the tape or rule in meters. At this system, the long distance measuring instruments such as ultrasonic distance meter or laser displacement sensor can be also calibrated.

Proceedings Article | 3 August 2010 Paper

Determination of refractive index of transparent plate by Fabry-Perot fringe analysis

Hee Joo Choi, Hwan Hong Lim, Han Seb Moon, Tae Bong Eom, Jung Ju, Myoungsik Cha

Proceedings Volume 7790, 77900Z (2010) https://doi.org/10.1117/12.862363

KEYWORDS: Refractive index, Fringe analysis, Refraction, Fabry–Perot interferometers, Interferometry, Silica, Solids, Helium neon lasers, Collimation, Wave plates

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Proceedings Article | 14 May 2010 Paper

One-shot measurement of surface profile using an astigmatic microscope system

C.-S. Kang, J.-U. Lee, J. W. Kim, J.-A. Kim, J. Jin, T. B. Eom

Proceedings Volume 7718, 77180X (2010) https://doi.org/10.1117/12.854124

KEYWORDS: Point spread functions, 3D metrology, Cylindrical lenses, Optical components, Sensors, Cerium, Microscopes, Computer simulations, Monochromatic aberrations, Calibration

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Proceedings Article | 10 September 2007 Paper

Calibration of integrating sphere system designed for roughness correction in optical calibration of gauge blocks

Chu-Shik Kang, Jae Wan Kim, Jong-Ahn Kim, Tae Bong Eom

Proceedings Volume 6672, 66720O (2007) https://doi.org/10.1117/12.733712

KEYWORDS: Calibration, Integrating spheres, Phase shifts, Surface roughness, Light scattering, Optical calibration, Reflection, System integration, Scattering, Optical interferometry

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Proceedings Article | 10 September 2007 Paper

Development of a precision dual level stage system for the dimensional metrology of large range surface topography

Jong-Ahn Kim, Jae Wan Kim, Tae Bong Eom, Chu-Shik Kang

Proceedings Volume 6672, 66720T (2007) https://doi.org/10.1117/12.732617

KEYWORDS: Interferometers, Mirrors, Metrology, Field programmable gate arrays, Dimensional metrology, Ferroelectric materials, Motion measurement, Control systems, Amplifiers, Scanning probe microscopy

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Proceedings Article | 18 August 2005 Paper

A novel Michelson interferometer combined with an autocollimator for the simultaneous measurement of linear and angular displacement

Jae Wan Kim, Jong-Ahn Kim, Chu-Shik Kang, Tae Bong Eom

Proceedings Volume 5879, 587911 (2005) https://doi.org/10.1117/12.616497

KEYWORDS: Autocollimators, Mirrors, Interferometers, Motion measurement, Mica, Michelson interferometers, Wave plates, Beam splitters, Polarization, Prototyping

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Proceedings Article | 18 August 2005 Paper

Calibration of two-dimensional nanometer gratings using optical diffractometer and metrological atomic force microscope

Jong-Ahn Kim, Jae Wan Kim, Byong Chon Park, Tae Bong Eom, Chu-Shik Kang

Proceedings Volume 5879, 58790Z (2005) https://doi.org/10.1117/12.614786

KEYWORDS: Calibration, Metrology, Diffraction, Interferometers, Atomic force microscope, Beam splitters, Scanning electron microscopy, Sensors, Temperature metrology, Diffraction gratings

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Proceedings Article | 20 November 2003 Paper

Device for calibration of the height micrometers and the squareness standards

Tae Bong Eom

Proceedings Volume 5190, (2003) https://doi.org/10.1117/12.505412

KEYWORDS: Calibration, Interferometers, Mirrors, Sensors, Standards development, Heterodyning, Motion measurement, Helium neon lasers, Ferroelectric materials, Lasers

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Proceedings Article | 2 June 2003 Paper

Atomic force microscopy of steep side-walled feature with carbon nanotube tip

Byong Chon Park, Jae-Hyun Kang, Ki Jung, Won Young Song, Beomhoan O, TaeBong Eom

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482816

KEYWORDS: Atomic force microscopy, Carbon nanotubes, Silicon, Critical dimension metrology, Silicon carbide, Adsorption, Metrology, Positive feedback, Computer engineering, Carbon

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Proceedings Article | 30 May 2003 Paper

Novel interferometer for three-dimensional coordinate measurement of freely moving objects

Jae Wan Kim, Chu-Shik Kang, Tae Bong Eom

Proceedings Volume 5144, (2003) https://doi.org/10.1117/12.500417

KEYWORDS: Interferometers, Sensors, Optical fibers, Beam splitters, Spherical lenses, 3D metrology, Signal detection, Fiber lasers, Laser stabilization, Distance measurement

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Proceedings Article | 29 July 2002 Paper

Nonlinearity-free heterodyne laser interferometer

TaeBong Eom, Jae Wan Kim, Myung-Sai Chung

Proceedings Volume 4900, (2002) https://doi.org/10.1117/12.484570

KEYWORDS: Interferometers, Electronics, Heterodyning, Computer programming, Phase measurement, Capacitance, Beam splitters, Homodyne detection, Linear filtering, Signal detection

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Proceedings Article | 16 July 2002 Paper

Atomic force microscopy with carbon nanotube tip for critical dimension measurement

Byong Chon Park, Ki Jung, Won Young Song, Beomhoan O, TaeBong Eom

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473510

KEYWORDS: Atomic force microscopy, Silicon, Carbon, Scanning electron microscopy, Carbon nanotubes, Critical dimension metrology, Contamination, Metrology, Silicon carbide, Ion beams

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Proceedings Article | 21 May 1996 Paper

Linewidth measurement of wafers using SEM and its uncertainty evaluation

Yeong-Uk Ko, TaeBong Eom, Ki-Hong Kim, Seung-Woo Kim

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240080

KEYWORDS: Scanning electron microscopy, Interferometers, Electron beams, Calibration, Semiconducting wafers, Standards development, Statistical analysis, Electron microscopes, Semiconductors, Image resolution

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Proceedings Article | 1 June 1992 Paper

Scanning electron microscope system for linewidth measurement of IC

Cheon Eom, TaeBong Eom, Yeong-Uk Ko, Myung-Sai Chung

Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59784

KEYWORDS: Scanning electron microscopy, Electron beams, Interferometers, Electron microscopes, Monte Carlo methods, Image resolution, Calibration, Integrated circuits, Sensors, Distortion

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Showing 5 of 14 publications

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