Dr. Taegeun Kim
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Wafer-level optics, Cadmium, Ions, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Semiconductors, Lithography, Scanners, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Wafer-level optics, Defect detection, Modulation, Scanners, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Scanners, Inspection, Electroluminescence, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

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