Mr. Tae-Joong Ha
Principal Engineer at SK Hynix Inc
SPIE Involvement:
Author
Publications (18)

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Etching, Image processing, Chromium, Scanning electron microscopy, Transmission electron microscopy, Signal processing, Photomasks, Double patterning technology, Critical dimension metrology, Phase shifts

PROCEEDINGS ARTICLE | October 29, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Etching, Chromium, Image analysis, Transmittance, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Etching, Particles, Manufacturing, Inspection, Control systems, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Plasma etching, Plasma

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Multilayers, Etching, Ultraviolet radiation, Reflectivity, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Scanning probe microscopy, Semiconducting wafers, Ruthenium

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Etching, Particles, Manufacturing, Reliability, Inspection, Chromium, Photomasks, Critical dimension metrology, Optics manufacturing

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Electron beam lithography, Calibration, Etching, Dry etching, Image processing, Reliability, Chromium, Scanning electron microscopy, Photomasks, Critical dimension metrology

Showing 5 of 18 publications
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