Mr. Tae-Yong Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Semiconductors, Reticles, Electronics, Contamination, Inspection, Signal processing, Wafer inspection, Semiconducting wafers, Yield improvement, Defect inspection

PROCEEDINGS ARTICLE | April 16, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Deep ultraviolet, Polarization, Etching, Inspection, Reflectivity, Computer simulations, Finite element methods, Wafer inspection, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Wafer-level optics, Semiconductors, Lithography, Metrology, Image processing, Optical testing, Scanning electron microscopy, Process control, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Electronics, Sensors, Electron microscopes, Control systems, Image analysis, Scanning electron microscopy, Image quality, Critical dimension metrology, Semiconducting wafers, Electron transport

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Wafer-level optics, Semiconductors, Capacitors, Defect detection, Scattering, Inspection, Interference (communication), Monte Carlo methods, Wafer inspection, Semiconducting wafers

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Semiconductors, Metrology, Distortion, Image analysis, Image filtering, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

Showing 5 of 8 publications
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