Taejun You
at SK Hynix Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Semiconducting wafers, Photomasks, Critical dimension metrology, Reflection, Optical proximity correction, Optical lithography, Dry etching, Buildings, Lithography, Image processing, Data modeling, Visualization, Scanning electron microscopy, Antireflective coatings

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