Mr. Taejun You
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Data modeling, Calibration, Etching, 3D modeling, Scanning electron microscopy, Wafer inspection, Virtual reality, Semiconducting wafers, Process modeling, Chemical mechanical planarization

PROCEEDINGS ARTICLE | December 14, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Data modeling, Polarization, Calibration, Image processing, Scanners, Transistors, Optical proximity correction, Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Semiconductors, Lithography, Metrology, Optical lithography, Polarization, Critical dimension metrology, Polarization control, Semiconducting wafers, Resolution enhancement technologies, Fiber optic illuminators

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Diffractive optical elements, Printing, Source mask optimization, SRAF, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies, Fiber optic illuminators

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Light sources, Optical lithography, Lithographic illumination, Manufacturing, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Lithographic illumination, Etching, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Forward error correction, Photoresist processing, Semiconducting wafers

Showing 5 of 10 publications
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