Taejun You
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Data modeling, Semiconducting wafers, 3D modeling, Etching, Chemical mechanical planarization, Scanning electron microscopy, Process modeling, Virtual reality, Wafer inspection, Calibration

Proceedings Article | 14 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Optical proximity correction, Data modeling, Calibration, Lithography, Transistors, Semiconducting wafers, Polarization, Image processing, Process modeling, Scanners

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Polarization, Critical dimension metrology, Semiconducting wafers, Lithography, Optical lithography, Resolution enhancement technologies, Polarization control, Fiber optic illuminators, Semiconductors, Metrology

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: SRAF, Diffractive optical elements, Resolution enhancement technologies, Photoresist processing, Lithography, Printing, Source mask optimization, Fiber optic illuminators, Semiconducting wafers, Optical lithography

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: SRAF, Optical lithography, Photomasks, Optical proximity correction, Resolution enhancement technologies, Lithographic illumination, Lithography, Light sources, Phase shifts, Manufacturing

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Lithographic illumination, Photomasks, Photoresist processing, Printing, Etching, Semiconducting wafers, Critical dimension metrology, Forward error correction, Optical proximity correction

Showing 5 of 10 publications
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