Mr. Tai Yong Teo
at Nanyang Technological Univ
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | July 15, 2003
Proc. SPIE. 5041, Process and Materials Characterization and Diagnostics in IC Manufacturing
KEYWORDS: Polishing, Silica, Metals, Particles, Copper, Scanning electron microscopy, Abrasives, Semiconducting wafers, Surface finishing, Chemical mechanical planarization

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