Taian Fan
at Institute of Microelectronics
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Light sources, Lithographic illumination, Image resolution, 3D modeling, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Diffraction, Spatial frequencies, 3D modeling, Near field, Photomasks, Extreme ultraviolet, EUV optics

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top