Taian Fan
at Institute of Microelectronics
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Polishing, Deep ultraviolet, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Plasma etching, Extreme ultraviolet lithography, Optical proximity correction

SPIE Journal Paper | 30 May 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Line edge roughness, Failure analysis, Bridges, Etching, Lithography, Probability theory, Overlay metrology, Photomasks, Metals, Optical proximity correction

SPIE Journal Paper | 20 December 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Semiconducting wafers, Lithography, Nitrogen, Photoresist materials, Particles, Microelectronics, Computer simulations, Fluctuations and noise, Semiconductor manufacturing, Polymers

Proceedings Article | 3 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Light sources, Lithographic illumination, Image resolution, 3D modeling, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Diffraction, Spatial frequencies, 3D modeling, Near field, Photomasks, Extreme ultraviolet, EUV optics

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