Taian Fan
Research Engineer at Institute of Microelectronics
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 20 September 2020 Poster + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Lithography, Deep ultraviolet, Manufacturing, Photomasks, Extreme ultraviolet lithography, Source mask optimization, Computational lithography, Nanoimprint lithography, Optimization (mathematics)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Light scattering, Reflectivity, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Critical dimension metrology

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Computer simulations, Extreme ultraviolet, Extreme ultraviolet lithography, Compressed sensing

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Polishing, Deep ultraviolet, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Plasma etching, Extreme ultraviolet lithography, Optical proximity correction

SPIE Journal Paper | 30 May 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Line edge roughness, Failure analysis, Bridges, Etching, Lithography, Probability theory, Overlay metrology, Photomasks, Metals, Optical proximity correction

Showing 5 of 8 publications
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