Taichi Yamazaki
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Silica, Opacity, Chemical vapor deposition, Photomasks, Excimer lasers, Critical dimension metrology, Radiation effects, 193nm lithography, Phase shifts

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Silica, Opacity, Silicon, Transmission electron microscopy, Photomasks, Excimer lasers, Radiation effects, 193nm lithography, Oxidation

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Glasses, Inspection, Image resolution, Chromium, Photomasks, Optical simulations, SRAF, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Chromium, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

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