Dr. Taiichi Furukawa
Senior Researcher at JSR Micro Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 20 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Optical lithography, Etching, Hydrogen, Resistance, Fourier transforms, Chemical vapor deposition, Extreme ultraviolet, Double patterning technology, Critical dimension metrology, Fluorine

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Roads, Quartz, Sputter deposition, Polymers, Metals, Ultraviolet radiation, Silicon, Humidity, Adhesives, Protactinium

Proceedings Article | 23 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Refractive index, Microfluidics, Transparency, Contamination, Water, Ultraviolet radiation, Laser irradiation, Transmittance, Absorbance, Immersion lithography

Proceedings Article | 9 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Refractive index, Transparency, Optical properties, Water, Ultraviolet radiation, Manufacturing, Laser irradiation, Transmittance, Absorbance, Immersion lithography

Proceedings Article | 11 April 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Refractive index, Microfluidics, Water, Photoresist materials, Transmittance, Absorbance, Immersion lithography, Semiconducting wafers, 193nm lithography

Showing 5 of 6 publications
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