Takaaki Hiraka
at DNP Corporation USA
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 30 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Inspection, Nanoimprint lithography, Photomasks, Quartz, Vestigial sideband modulation, Defect inspection, Image processing, Manufacturing, Electronic components, Beam shaping

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Photomasks, Nanoimprint lithography, Vestigial sideband modulation, Ultraviolet radiation, Manufacturing, Optical lithography, Image processing, Transmission electron microscopy, Atomic force microscopy, Line edge roughness

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Vestigial sideband modulation, Nanoimprint lithography, Photomasks, Inspection, Scanning electron microscopy, Quartz, Line edge roughness, Manufacturing, Transmission electron microscopy, Beam shaping

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Photomasks, Nanoimprint lithography, Vestigial sideband modulation, Manufacturing, Ultraviolet radiation, Optical lithography, Image processing, Transmission electron microscopy, Beam shaping, Atomic force microscopy

Proceedings Article | 20 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Photomasks, Vestigial sideband modulation, Nanoimprint lithography, Manufacturing, Ultraviolet radiation, Line edge roughness, Image processing, Optical lithography, Etching, Quartz

Showing 5 of 9 publications
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