Takaaki Kuribayashi
at Renesas Electronics Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Optical lithography, Cadmium, Etching, Resistance, Process control, Logic devices, Spatial resolution, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Light sources, Computer simulations, Laser stabilization, Optical simulations, Laser cutting, Logic devices, SRAF, Critical dimension metrology, Tolerancing, Combined lens-mirror systems

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