Mr. Takaei Sasaki Profile

Takaei Sasaki

Manager at ULVAC Coating Corp

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Author

Publications (13)

Proceedings Article | 8 November 2005 Paper

The possibility of CrOx as the top coating material on a MoSi HT

Noriyuki Harashima, Hiroyuki Iso, Tatsuya Isozaki, Naohiro Umeo, Takaei Sasaki

Proceedings Volume 5992, 59923R (2005) https://doi.org/10.1117/12.633291

KEYWORDS: Binary data, Chromium, Dry etching, Etching, Metals, Thin films, Coating, Critical dimension metrology, Photomasks, Absorbance

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Proceedings Article | 6 December 2004 Paper

New structure of ArF high-transmittance attenuated phase-shifting mask with dry etching process

Hiroyuki Iso, Noriyuki Harashima, Tatsuya Isozaki, Shuichiro Kanai, Takaei Sasaki

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.579067

KEYWORDS: Transmittance, Etching, Dry etching, Quartz, Photomasks, Phase shifts, Silica, Chromium, Reflectivity, Mask making

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Proceedings Article | 28 August 2003 Paper

Advanced NLD mask dry etching system for 90-nm node technology

Noriyuki Harashima, Takaei Sasaki, Kiyoshi Kuwahara, Toshio Hayashi, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Mutsumi Hara, Yukio Ohkubo

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504200

KEYWORDS: Photomasks, Etching, Dry etching, Plasma, Helium, Magnetism, Chromium, Scanning electron microscopy, Semiconductors, Lithography

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Proceedings Article | 27 December 2002 Paper

Improvement of NLD mask dry etching system for 100-nm-node technology

Yoshiyuki Tanaka, Nobuyuki Yoshioka, Noriyuki Harashima, Takaei Sasaki, Kiyoshi Kuwahara, Toshio Hayashi, Mutsumi Hara, Yasushi Ohkubo

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467914

KEYWORDS: Antennas, Etching, Dry etching, Photomasks, Plasma, Lithography, Photoresist processing, Control systems, Modulation

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Proceedings Article | 11 March 2002 Paper

Photomask blank shelf-life study on e-beam chemically amplified resists

Feng Qian, David Chan, Masahiko Ishizuka, Akira Kurabayashi, Takumi Ogawa, Ryoichi Kobayashi, Takaei Sasaki

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458337

KEYWORDS: Photomasks, Packaging, Compact discs, Critical dimension metrology, Chemically amplified resists, Thin film coatings, Scanning electron microscopy, Environmental sensing, Polymers, Control systems

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Proceedings Article | 5 September 2001 Paper

Improvement of NLD mask dry etching system

Tatsuya Fujisawa, Nobuyuki Yoshioka, Takaei Sasaki, Kazuhide Yamashiro

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438356

KEYWORDS: Etching, Modulation, Magnetism, Dry etching, Photomasks, Plasma, Antennas, Critical dimension metrology, Photoresist processing, Semiconductors

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Proceedings Article | 22 January 2001 Paper

Evaluation of loading effect of NLD dry etching: II

Tatsuya Fujisawa, Takayuki Iwamatsu, Koji Hiruta, Hiroaki Morimoto, Noriyuki Harashima, Takaei Sasaki, Mutsumi Hara, Kazuhide Yamashiro, Yasushi Okubo, Yoichi Takehana

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410736

KEYWORDS: Etching, Dry etching, Plasma, Photoresist processing, Critical dimension metrology, Antennas, Optical proximity correction, Magnetism, Quartz, Semiconductors

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Proceedings Article | 22 January 2001 Paper

Development of a MoSi-based bilayer HT-PSM blank for ArF lithography

Shuichiro Kanai, Susumu Kawada, Akihiko Isao, Takaei Sasaki, Kazuyuki Maetoko, Nobuyuki Yoshioka

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410767

KEYWORDS: Lithography, 193nm lithography, Sputter deposition, Transmittance, Photomasks, Dry etching, Inspection, Quartz, Laser irradiation, Etching

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Proceedings Article | 19 July 2000 Paper

Evaluation of loading effect of NLD dry etching

Takayuki Iwamatsu, Tatsuya Fujisawa, Koji Hiruta, Hiroaki Morimoto, Noriyuki Harashima, Takaei Sasaki, Mutsumi Hara, Kazuhide Yamashiro, Yasushi Okubo, Yoichi Takehana

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392060

KEYWORDS: Etching, Dry etching, Photomasks, Critical dimension metrology, Scanning electron microscopy, Mask making, Plasma, Photoresist processing, Plasma etching, Chromium

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Proceedings Article | 25 August 1999 Paper

Fabrication of MoSiON halftone masks using ZEP7000 for MEBES 4500

Kazuyuki Maetoko, Koji Tange, Hitoshi Fukuma, Nobuyuki Yoshioka, Susumu Kawada, Masahiko Ishizuka, Takaei Sasaki, Charles Sauer

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360216

KEYWORDS: Polymers, Photomasks, Coating, Manufacturing, Halftones, Electron beams, Molybdenum, Defect inspection, Phase shifts, Critical dimension metrology

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Proceedings Article | 25 August 1999 Paper

Advanced Cr dry etching process

Satoshi Aoyama, Shouichi Sakamoto, Tsutomu Koike, Nobuyuki Yoshioka, Noriyuki Harashima, Atsushi Hayashi, Takaei Sasaki

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360246

KEYWORDS: Etching, Chromium, Photomasks, Dry etching, Logic, Critical dimension metrology, Scanning electron microscopy, Logic devices, Reactive ion etching, Plasma etching

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Proceedings Article | 25 August 1999 Paper

Evaluation of NLD mask dry etching system

Tatsuya Fujisawa, Takayuki Iwamatsu, Koji Hiruta, Hiroaki Morimoto, Takaei Sasaki, Kazuhide Yamashiro

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360255

KEYWORDS: Etching, Dry etching, Plasma, Photomasks, Magnetism, Plasma systems, Antennas, Prototyping, Scanning electron microscopy, Chlorine

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Proceedings Article | 28 July 1997 Paper

Dry etching with consideration to thicker reticle size

Eiichi Hoshino, Hideaki Hasegawa, Kunio Shishido, Nobuyuki Yoshioka, Satoshi Aoyama, Atsushi Hayashi, Takaei Sasaki, Michael Iso, Yasuo Tokoro

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277254

KEYWORDS: Reticles, Dry etching, Etching, Critical dimension metrology, Electron beams, Laser processing, Phase shifts, Reactive ion etching, Photomasks, Plasma

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Showing 5 of 13 publications

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