Mr. Takafumi Niwa
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Optical lithography, Image processing, Scanners, Manufacturing, Scanning electron microscopy, Printing, Photomasks, Double patterning technology, Photoresist processing

PROCEEDINGS ARTICLE | March 22, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Water, Diffusion, Digital watermarking, Scanning electron microscopy, Bridges, Immersion lithography, Thin film coatings, Semiconducting wafers, Temperature metrology

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Contamination, Spectroscopy, Silicon, Surface roughness, Mass spectrometry, Oxygen, Thin film coatings, Photoresist processing, Semiconducting wafers, Liquids

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Water, Coating, Photomasks, Semiconductor manufacturing, Immersion lithography, Critical dimension metrology, Thin film coatings, Halftones, Photoresist processing, Semiconducting wafers

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