Takaharu Nagai
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Publications (18)

Proceedings Article | 10 April 2024 Presentation
Takaharu Nagai, Hisayoshi Watanabe, Hideki Cho
Proceedings Volume PC12956, PC129560A (2024) https://doi.org/10.1117/12.3010084
KEYWORDS: Nanoimprint lithography, Electron beam lithography, Lithography, Fabrication, Semiconductors, Scattering, Power consumption, Overlay metrology, Optical lithography, Multilayers

Proceedings Article | 29 September 2023 Paper
Hisayoshi Watanabe, Takaharu Nagai, Koji Ichimura
Proceedings Volume 12915, 1291504 (2023) https://doi.org/10.1117/12.2684687
KEYWORDS: Nanoimprint lithography, Scanning electron microscopy, Overlay metrology, Fabrication, Lithography, Electron beam lithography, Design and modelling, 3D acquisition, Semiconductors

Proceedings Article | 30 April 2023 Presentation
Takaharu Nagai, Hisayoshi Watanabe, Koji Ichimura
Proceedings Volume PC12497, PC1249708 (2023) https://doi.org/10.1117/12.2661643
KEYWORDS: Nanoimprint lithography, Lithography, Metals, Semiconductors, Extreme ultraviolet lithography, Extreme ultraviolet, Double patterning technology, 3D acquisition

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11610, 116100B (2021) https://doi.org/10.1117/12.2584791
KEYWORDS: Nanoimprint lithography, Lithography, Double patterning technology, Photomasks, Overlay metrology, Fabrication, Ultraviolet radiation, Semiconductors, Semiconducting wafers, Polymers

SPIE Journal Paper | 5 February 2016
JM3, Vol. 15, Issue 02, 021006, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021006
KEYWORDS: Nanoimprint lithography, High volume manufacturing, Image processing, Critical dimension metrology, Lithography, Semiconductors, Semiconducting wafers, Photomasks, Ultraviolet radiation, Liquids

Showing 5 of 18 publications
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