Takahiro Hiromatsu
at HOYA Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Radon, Ions, Diffusion, Coating, Photomasks, Photoresist processing, Chemically amplified resists

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Optical lithography, Etching, Coating, Chromium, Photomasks, SRAF, Line edge roughness, Photoresist processing, Liquids, Absorption

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