Dr. Takahiro Ikeda
at Toshiba Corp
SPIE Involvement:
Author
Publications (11)

SPIE Journal Paper | 2 October 2014 Open Access
Hideaki Abe, Yasuhiko Ishibashi, Chihiro Ida, Akira Hamaguchi, Takahiro Ikeda, Yuichiro Yamazaki
JM3, Vol. 13, Issue 04, 041405, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041405
KEYWORDS: Metrology, Scatterometry, X-rays, Nondestructive evaluation, Scattering, Scanning electron microscopy, Semiconducting wafers, Etching, Scatter measurement, Silicon

Proceedings Article | 2 April 2014 Paper
Akira Hamaguchi, Hideaki Abe, Yasuhiko Ishibashi, Chihiro Ida, Takahiro Ikeda, Yuichiro Yamazaki
Proceedings Volume 9050, 90501L (2014) https://doi.org/10.1117/12.2048686
KEYWORDS: Metrology, Scatterometry, Nondestructive evaluation, Inspection, Semiconducting wafers, Scattering, Silicon, X-rays, Scatter measurement, Signal detection

Proceedings Article | 2 April 2010 Paper
Manabu Takakuwa, Kazutaka Ishigo, Masafumi Asano, Takahiro Ikeda, Kentaro Kasa, Nobuhiro Komine
Proceedings Volume 7638, 76382G (2010) https://doi.org/10.1117/12.846344
KEYWORDS: Inspection, Semiconducting wafers, Error analysis, Overlay metrology, Visualization, Statistical analysis, Optimization (mathematics), Semiconductors, Lithography, Metrology

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7638, 763827 (2010) https://doi.org/10.1117/12.846471
KEYWORDS: Statistical analysis, Critical dimension metrology, Error analysis, Semiconductor manufacturing, Data analysis, Shape analysis, Process control, Metrology, Monte Carlo methods, Tolerancing

Proceedings Article | 22 March 2008 Paper
Proceedings Volume 6922, 692214 (2008) https://doi.org/10.1117/12.771878
KEYWORDS: Inspection, Process control, Metrology, Optical lithography, Strontium, Fiber Bragg gratings, Lithography

Showing 5 of 11 publications
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