Dr. Takahiro Ikeda
at Toshiba Corp
SPIE Involvement:
Author
Publications (11)

SPIE Journal Paper | 2 October 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Scatterometry, X-rays, Nondestructive evaluation, Scattering, Scanning electron microscopy, Semiconducting wafers, Etching, Scatter measurement, Silicon

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Scattering, X-rays, Silicon, Inspection, Nondestructive evaluation, Scatterometry, Semiconducting wafers, Scatter measurement, Signal detection

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Metrology, Statistical analysis, Error analysis, Monte Carlo methods, Process control, Shape analysis, Semiconductor manufacturing, Critical dimension metrology, Tolerancing, Data analysis

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconductors, Lithography, Metrology, Statistical analysis, Visualization, Error analysis, Inspection, Optimization (mathematics), Semiconducting wafers, Overlay metrology

Proceedings Article | 22 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Metrology, Optical lithography, Fiber Bragg gratings, Inspection, Process control, Strontium

Showing 5 of 11 publications
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