Takahiro Kawasaki
at Hitachi High-Tech Science Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Ultraviolet radiation, Scanning electron microscopy, Transmission electron microscopy, Time metrology, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes

SPIE Journal Paper | 23 July 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Detection and tracking algorithms, Critical dimension metrology, Image filtering, Stochastic processes, Metrology, Reliability

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Edge detection, Metrology, Detection and tracking algorithms, Reliability, Scanning electron microscopy, Process control, Image filtering, Critical dimension metrology, Line edge roughness

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Manufacturing, Scanning electron microscopy, Transmission electron microscopy, Atomic layer deposition, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness

Proceedings Article | 18 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Metrology, Cadmium, Electron microscopes, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Critical dimension metrology, Line edge roughness, Scanning transmission electron microscopy, 3D image processing

Showing 5 of 9 publications
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