Prof. Takahiro Kozawa
Professor at Osaka Univ
SPIE Involvement:
Conference Program Committee | Author
Publications (72)

Proceedings Article | 24 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Semiconductors, Lithography, Monte Carlo methods, Extreme ultraviolet, Machine learning, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Information science, Industrial chemicals

Proceedings Article | 23 March 2020
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Lithography, Electron beam lithography, FT-IR spectroscopy, Polymers, Ionization, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography

Proceedings Article | 23 March 2020
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Semiconductors, Lithography, Polymers, Image processing, Ions, Monte Carlo methods, Photomasks, Temperature metrology, Absorption, Chemically amplified resists

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Carbon, Lithography, Optical lithography, Chemical species, Scanning electron microscopy, Fluorine, Absorption

Showing 5 of 72 publications
Conference Committee Involvement (2)
International Conference on Extreme Ultraviolet Lithography 2020
20 September 2020 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2019
16 September 2019 | Monterey, California, United States
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