Prof. Takahiro Kozawa
Professor at Osaka Univ
SPIE Involvement:
Conference Program Committee | Author
Publications (62)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Oxides, Nanoparticles, Polymers, Metals, Diffusion, Extreme ultraviolet lithography, Line edge roughness, Zirconium dioxide, Stochastic processes, Chemically amplified resists

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Electron beam lithography, Polymethylmethacrylate, Polymers, Molecules, Silicon, Scanning electron microscopy, Nanoimprint lithography, Semiconducting wafers, Nanolithography

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Oxides, Nanoparticles, Polymers, Metals, Diffusion, Extreme ultraviolet lithography, Line edge roughness, Zirconium dioxide, Stochastic processes, Chemically amplified resists

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Polymers, Metals, Photons, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Yield improvement, Photoresist developing, Absorption

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Electron beams, Nanoparticles, Polymers, Metals, Ions, Silver, Absorbance, Picosecond phenomena, Polymer thin films, Absorption

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Electron beams, Polymers, Molecules, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Absorption, Chemically amplified resists

Showing 5 of 62 publications
Conference Committee Involvement (1)
International Conference on Extreme Ultraviolet Lithography 2019
15 September 2019 | Monterey, California, United States
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