Takahiro Matsumoto
at Canon Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 22 March 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Actuators, Lithography, Capillaries, Ultraviolet radiation, Particles, Distortion, Photomasks, Semiconductor manufacturing, High volume manufacturing, Nanoimprint lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 25 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Semiconductors, Lithography, Metrology, Silicon, Inspection, Distortion, Scatterometry, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 4 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Semiconductors, Lithography, Data modeling, Control systems, Inverse problems, Signal processing, Finite element methods, Critical dimension metrology, Semiconducting wafers, Wafer testing

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Semiconductors, Lithography, Error analysis, Coating, Photoresist materials, Signal processing, Optical alignment, Analytical research, Semiconducting wafers, Near field optics

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Semiconductors, Tungsten, Atomic force microscopy, Atomic force microscope, Optical alignment, Data centers, Photoresist processing, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Semiconductors, Error analysis, Tungsten, Signal processing, Chemical analysis, Optical alignment, Semiconducting wafers, Overlay metrology, Near field optics, Chemical mechanical planarization

Showing 5 of 6 publications
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