Takahiro Nakayama
at CANON INC
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Semiconductors, Lithography, Optical lithography, Particles, Manufacturing, Photomasks, Line width roughness, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 26 March 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Semiconductors, Lithography, Optical lithography, Particles, Manufacturing, Photomasks, Line width roughness, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Polishing, Curtains, Particles, Ceramics, Control systems, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers, Liquids

Proceedings Article | 21 March 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Semiconductors, Lithography, Polishing, Optical lithography, Curtains, Ultraviolet radiation, Particles, Ceramics, Control systems, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers, Surface finishing

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Semiconductors, Lithography, Curtains, Particles, Manufacturing, Image resolution, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers

Showing 5 of 9 publications
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