Takahiro Sakaguchi
at Nissan Chemical Industries Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Reflection, Sensors, Etching, Silicon, Reflectivity, Immersion lithography, Photoresist processing, Semiconducting wafers, System on a chip

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Etching, Dry etching, Ultraviolet radiation, Coating, Resistance, Chromium, Scanning electron microscopy, Photomasks, Fluorine, Photoresist processing

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Carbon, Lithography, Etching, Silicon, Reflectivity, Photomasks, Photoresist processing, Semiconducting wafers, System on a chip, Bottom antireflective coatings

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Semiconductors, Oxides, Thin films, Etching, Silicon, Coating, Reflectivity, Photoresist materials, Plasma etching, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Oxides, Silica, Etching, Silicon, Resistance, Reflectivity, Photoresist materials, Semiconducting wafers, Photoresist developing, Bottom antireflective coatings

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