Mr. Takahisa Kikuchi Profile

Takahisa Kikuchi

Manager at Nikon Corp

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Author

Publications (7)

Proceedings Article | 23 March 2020 Presentation + Paper

Novel overlay correction using inline alignment station (iAS) for scanner

Takahisa Kikuchi, Ayako Sugimoto, Shigeru Eto, Akira Okutomi, Naoki Morita

Proceedings Volume 11327, 113270W (2020) https://doi.org/10.1117/12.2551973

KEYWORDS: Semiconducting wafers, Optical alignment, Scanners, Machine learning, Overlay metrology, Bessel functions, Metrology, Integration

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Proceedings Article | 15 March 2016 Paper

High-order aberration control during exposure for leading-edge lithography projection optics

Yasuhiro Ohmura, Yosuke Tsuge, Toru Hirayama, Hironori Ikezawa, Daisuke Inoue, Yasuhiro Kitamura, Yukio Koizumi, Keisuke Hasegawa, Satoshi Ishiyama, Toshiharu Nakashima, Takahisa Kikuchi, Minoru Onda, Yohei Takase, Akimasa Nagahiro, Susumu Isago, Hidetaka Kawahara

Proceedings Volume 9780, 97800Y (2016) https://doi.org/10.1117/12.2218840

KEYWORDS: Wavefronts, Control systems, Deformable mirrors, Distortion, Optical lithography, Lithography, Projection systems, Overlay metrology, Performance modeling, Mirrors

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Proceedings Article | 12 April 2013 Paper

Mix-and-match overlay performance of the NSR-S622D immersion scanner

Katsushi Makino, Takahisa Kikuchi, Satoru Sasamoto, Park Hongki, Akiko Mori, Nobuyuki Takahashi, Shinji Wakamoto

Proceedings Volume 8683, 86830Q (2013) https://doi.org/10.1117/12.2010875

KEYWORDS: Distortion, Semiconducting wafers, Source mask optimization, Reticles, Overlay metrology, Scanners, Metrology, Lithography, Optical alignment, Motion models

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Proceedings Article | 13 March 2012 Paper

High overlay accuracy for double patterning using an immersion scanner

Yuji Shiba, Katsushi Makino, Yasuhiro Morita, Chihaya Motoyoshi, Hajime Yamamoto, Jin Udagawa, Takahisa Kikuchi, Yosuke Shirata, Yuuki Ishii

Proceedings Volume 8326, 83260T (2012) https://doi.org/10.1117/12.916246

KEYWORDS: Double patterning technology, Optical alignment, Distortion, Semiconducting wafers, Overlay metrology, Reticles, Scanners, Cooling systems, Lithography, Semiconductor manufacturing

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Proceedings Article | 23 March 2011 Paper

Stability and calibration of overlay and focus control for a double patterning immersion scanner

Masahiko Yasuda, Shinji Wakamoto, Hiroto Imagawa, Shinya Takubo, Yuuji Shiba, Takahisa Kikuchi, Yosuke Shirata, Yuuki Ishii

Proceedings Volume 7973, 79730Z (2011) https://doi.org/10.1117/12.879291

KEYWORDS: Calibration, Computer programming, Metrology, Interferometers, Distortion, Semiconducting wafers, Double patterning technology, Overlay metrology, Control systems, Scanners

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Proceedings Article | 10 March 2010 Paper

Double patterning lithography study with high overlay accuracy

Takahisa Kikuchi, Yosuke Shirata, Masahiko Yasuda, Yasuhiro Iriuchijima, Kengo Takemasa, Ryo Tanaka, Andrew Hazelton, Yuuki Ishii

Proceedings Volume 7640, 76400H (2010) https://doi.org/10.1117/12.846486

KEYWORDS: Double patterning technology, Lithography, Optical lithography, Semiconducting wafers, Photoresist processing, Scanning electron microscopy, Immersion lithography, Scanners, Glasses, Overlay metrology

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Proceedings Article | 14 September 2001 Paper

Introduction of new techniques for matching overlay enhancement

Takahisa Kikuchi, Yuuki Ishii, Noriaki Tokuda

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435702

KEYWORDS: Semiconducting wafers, Distortion, Overlay metrology, Scanners, Optical alignment, Actuators, Reticles, Error analysis, Manufacturing, Semiconductors

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Showing 5 of 7 publications

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