Takahisa Kikuchi
at Nikon Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Wavefronts, Control systems, Deformable mirrors, Distortion, Optical lithography, Lithography, Projection systems, Overlay metrology, Performance modeling, Mirrors

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Distortion, Semiconducting wafers, Source mask optimization, Reticles, Overlay metrology, Scanners, Metrology, Lithography, Optical alignment, Motion models

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Double patterning technology, Optical alignment, Distortion, Semiconducting wafers, Overlay metrology, Reticles, Scanners, Cooling systems, Lithography, Semiconductor manufacturing

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Calibration, Computer programming, Metrology, Interferometers, Distortion, Semiconducting wafers, Double patterning technology, Overlay metrology, Control systems, Scanners

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Double patterning technology, Lithography, Optical lithography, Semiconducting wafers, Photoresist processing, Scanning electron microscopy, Immersion lithography, Scanners, Glasses, Overlay metrology

Showing 5 of 6 publications
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