Takahisa Otsuka
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 31 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Electronics, Scanners, Resistance, Immersion lithography, Logic devices, Thin film coatings, Photoresist processing, Semiconducting wafers, Yield improvement

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Contamination, Etching, Polymers, Scanners, Particles, Bridges, Critical dimension metrology, Photomicroscopy, Photoresist processing, Semiconducting wafers

Proceedings Article | 4 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Logic, Calibration, Etching, Scanners, Diffusion, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Temperature metrology

Proceedings Article | 4 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Metrology, Scanners, Particles, Manufacturing, Inspection, Bridges, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Standards development

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Reticles, Etching, Scanners, Monte Carlo methods, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Temperature metrology

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top