Mr. Takaki Hashimoto
at Toshiba Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Wafer-level optics, Lithography, Light sources, Ultraviolet radiation, Photoresist materials, Photomasks, Optimization (mathematics), Semiconducting wafers, UV optics, Algorithms

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Optical lithography, Photomasks, Source mask optimization, Critical dimension metrology, Neodymium, Molybdenum, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Etching, 3D modeling, Photomasks, Source mask optimization, Nanoimprint lithography, Reactive ion etching, Photoresist processing, Semiconducting wafers, 3D image processing

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