Takamitsu Furukawa
at SELETE
SPIE Involvement:
Conference Program Committee | Author
Publications (19)

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Fabrication, Semiconductors, Lithography, Lithographic illumination, Transmittance, Photomasks, Nanoimprint lithography, Line edge roughness, Photoresist processing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Phase shifting, Lithographic illumination, Objectives, Photomasks, Nanoimprint lithography, Line edge roughness, Tolerancing, Binary data, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Transparency, Polymers, Photomasks, Absorbance, Fluorine, Polymer thin films, Standards development, Phase shifts, Absorption

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Transparency, Polymers, Resistance, Absorbance, Line edge roughness, Chlorine, Fluorine, Industrial chemicals, Absorption

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Contamination, Polymers, Spectroscopy, Coating, Adsorption, Transmittance, Critical dimension metrology, Contamination control, Polymer thin films

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Lithographic illumination, Etching, Photomasks, Line edge roughness, Reactive ion etching, Photoresist processing, Binary data

Showing 5 of 19 publications
Conference Committee Involvement (1)
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
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