Takanori Kawakami
at JSR Engineering Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Polymers, Ultraviolet radiation, Molecules, NOx, Polymerization, Photomasks, Line edge roughness, Chlorine, Analog electronics

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Optical lithography, Polymers, Diffusion, Chemistry, Scanning electron microscopy, Photomasks, Absorbance, Chemical analysis, Line edge roughness

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Chemical species, Polymers, Scanners, Line width roughness, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Lithographic illumination, Etching, Chemical species, Polymers, Resistance, Photoresist materials, Immersion lithography, Fluorine, 193nm lithography

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Polymers, Diffusion, Coating, Photoresist materials, Modulation transfer functions, Neodymium, Photoresist processing, Polymer thin films, Chemically amplified resists

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