Takao Tamura
Senior Manager at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 22 February 2021 Poster + Presentation
Proc. SPIE. 11612, Advances in Patterning Materials and Processes XXXVIII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Quartz, Glasses, Silicon, Chromium, Photomasks, Line width roughness, Semiconducting wafers

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Scanning electron microscopy, Electronic components, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Chemically amplified resists

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Electron beams, Photomasks, Beam shaping, Critical dimension metrology

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Semiconductors, Lithography, Polymers, Image processing, Ions, Monte Carlo methods, Photomasks, Temperature metrology, Absorption, Chemically amplified resists

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Electron beam lithography, Electron beams, Photomasks, Extreme ultraviolet, Photoresist processing

Showing 5 of 23 publications
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