Takao Tamura
Senior Manager at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 26 March 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Electron beam lithography, Electron beams, Photomasks, Extreme ultraviolet, Photoresist processing

SPIE Journal Paper | 24 September 2018
JM3 Vol. 17 Issue 03
KEYWORDS: Modulation, Photomasks, Optical lithography, Critical dimension metrology, Image resolution, Line edge roughness, Photoresist processing, Electron beam lithography, Vestigial sideband modulation, Convolution

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Photomasks, Photoresist processing

Proceedings Article | 5 April 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Modulation, Image resolution, Photomasks, Beam shaping, Convolution, Photoresist processing, Vestigial sideband modulation

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Modulation, Data storage, Image processing, Interfaces, Data processing, Relays, Photomasks, Data conversion, Photoresist processing, Vestigial sideband modulation

Showing 5 of 19 publications
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