Takashi Adachi
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (17)

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Metals, Silicon, Transmittance, Photomasks, Excimer lasers, Double patterning technology, Optical proximity correction, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Opacity, Image processing, Inspection, Electroluminescence, Transmittance, Photomasks, Excimer lasers, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Finite-difference time-domain method, Metals, Image processing, Photomasks, Image enhancement, Immersion lithography, Optical proximity correction, Nanoimprint lithography, Photoresist processing

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Etching, Ions, Coating, Conductive coatings, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Optical lithography, Etching, Dry etching, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Ruthenium

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Optical lithography, Etching, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Mask making, Line edge roughness, Ruthenium

Showing 5 of 17 publications
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