Takashi Adachi
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Publications (17)

Proceedings Article | 10 May 2016 Paper
Proceedings Volume 9984, 998404 (2016) https://doi.org/10.1117/12.2242870
KEYWORDS: Lithography, Photomasks, Double patterning technology, Semiconducting wafers, Metals, Phase shifts, Optical proximity correction, Silicon, Excimer lasers, Transmittance

Proceedings Article | 9 July 2015 Paper
Proceedings Volume 9658, 96580P (2015) https://doi.org/10.1117/12.2197611
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Inspection, Transmittance, Excimer lasers, Electroluminescence, Phase shifts, Image processing, Opacity

Proceedings Article | 28 July 2014 Paper
Proceedings Volume 9256, 92560B (2014) https://doi.org/10.1117/12.2070056
KEYWORDS: Optical proximity correction, Photomasks, Nanoimprint lithography, Lithography, Image processing, Finite-difference time-domain method, Image enhancement, Metals, Photoresist processing, Immersion lithography

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73792I (2009) https://doi.org/10.1117/12.824332
KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Coating, Extreme ultraviolet lithography, Mask making, Conductive coatings, Critical dimension metrology, Photoresist processing, Ions

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 70281Q (2008) https://doi.org/10.1117/12.793068
KEYWORDS: Photomasks, Etching, Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Ruthenium, Optical lithography, Photoresist processing, Dry etching, Inspection

Showing 5 of 17 publications
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