Takashi Adachi
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Photomasks, Double patterning technology, Semiconducting wafers, Metals, Phase shifts, Optical proximity correction, Silicon, Excimer lasers, Transmittance

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Inspection, Transmittance, Excimer lasers, Electroluminescence, Phase shifts, Image processing, Opacity

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Optical proximity correction, Photomasks, Nanoimprint lithography, Lithography, Image processing, Finite-difference time-domain method, Image enhancement, Metals, Photoresist processing, Immersion lithography

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Coating, Extreme ultraviolet lithography, Mask making, Conductive coatings, Critical dimension metrology, Photoresist processing, Ions

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Photomasks, Etching, Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Ruthenium, Optical lithography, Photoresist processing, Dry etching, Inspection

Showing 5 of 17 publications
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