Takashi Hirano
at Kioxia Holdings Corp
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 19 April 2019
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Nanostructures, Diffraction, Scattering, Quartz, X-rays, Scanning electron microscopy, Transmission electron microscopy, Time metrology, Nanoimprint lithography, X-ray detectors

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Target detection, Signal to noise ratio, Defect detection, Deep ultraviolet, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Electron beams, Optical lithography, Etching, Scanning electron microscopy, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Optical lithography, Inspection, Scanning electron microscopy, Optical inspection, Scatterometry, Process control, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Defect detection, Deep ultraviolet, Inspection, Optical inspection, Optical resolution, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography

Showing 5 of 26 publications
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