Dr. Takashi Kamo
at Kioxia corporation
SPIE Involvement:
Author
Publications (41)

Proceedings Article | 29 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Line width roughness, Signal to noise ratio, Deep ultraviolet, Scanning electron microscopy, Critical dimension metrology, Extreme ultraviolet lithography

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Photomasks, Extreme ultraviolet, Tantalum, Semiconducting wafers, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Lithographic illumination, Line width roughness, Line edge roughness

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Photomasks, Line width roughness, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Edge roughness, Defect inspection

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Printing, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Atomic force microscopy, Extreme ultraviolet, Visualization, Inspection, Tolerancing, Optical alignment

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Photomasks, Line width roughness, Extreme ultraviolet, SRAF, Extreme ultraviolet lithography, Tantalum, Scanning electron microscopy, Chromium

Showing 5 of 41 publications
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