Takashi Makinoshima
at Mitsubishi Gas Chemical Co Inc
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Iodine, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical elements, Mass attenuation coefficient, Resist chemistry, Absorption

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Carbon, Etching, Silicon, Coating, Resistance, Chemical analysis, Semiconducting wafers, Chromatography, System on a chip

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Carbon, Lithography, Mechanics, Etching, Coating, Resistance, Raw materials, Extreme ultraviolet, Chemical analysis, Chromatography, System on a chip, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Carbon, Etching, Coating, Resistance, Electroluminescence, Raw materials, Chemical analysis, Chromatography, System on a chip, Plasma

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Scanning electron microscopy, Raw materials, Chemical analysis, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Industrial chemicals

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Electron beam lithography, Optical lithography, Glasses, Scanning electron microscopy, Raw materials, Chemical analysis, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Industrial chemicals

Showing 5 of 7 publications
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