Takashi Mizoguchi
at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Photomasks, SRAF, Opacity, Inspection, Chromium, Etching, Optical proximity correction, Photoresist processing, Resistance, Lithography

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Photomasks, Etching, Binary data, Opacity, Inspection, Image processing, Photoresist processing, Dry etching, Mask making, Thin films

Proceedings Article | 25 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Pellicles, Photomasks, Adhesives, Chromium, Distortion, Current controlled current source, Glasses, Interferometers, Helium neon lasers

Proceedings Article | 25 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Adhesives, Pellicles, Photomasks, Distortion, Quartz, Manufacturing, Inspection, Fermium, Frequency modulation, Lithography

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Pellicles, Adhesives, Aluminum, Photomasks, Polymers, Distortion, Manufacturing, Optical lithography, Switching, Cobalt

Showing 5 of 10 publications
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