Takashi Murakami
at NEC Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Logic, Optical lithography, Copper, Diffusion, Photomasks, Line width roughness, Logic devices, Photoresist processing, Resolution enhancement technologies

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Lithographic illumination, Metals, Scanners, Photomasks, Logic devices, SRAF, Binary data

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Lithography, Logic, Optical lithography, Metals, Immersion lithography, Logic devices, Optical proximity correction, SRAF, Resolution enhancement technologies

Proceedings Article | 22 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Reticles, Electronics, Etching, Chemical vapor deposition, Control systems, Logic devices, Critical dimension metrology, Semiconducting wafers, Temperature metrology

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