Dr. Takashi Sato
Scientist at Toshiba Memory Corp
SPIE Involvement:
Author
Publications (24)

SPIE Journal Paper | January 1, 2011
JM3 Vol. 10 Issue 1
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Extreme ultraviolet, Manufacturing, Semiconducting wafers, Diffraction, Critical dimension metrology, Optical lithography, Lithographic illumination

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Diffraction, Optical lithography, Lithographic illumination, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | April 1, 2010
JM3 Vol. 9 Issue 02
KEYWORDS: Diffraction, Tolerancing, Critical dimension metrology, Design for manufacturability, Manufacturing, Error analysis, Extreme ultraviolet lithography, Polarization, Extreme ultraviolet, Lithography

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Semiconductors, Electronics, Manufacturing, Data processing, Design for manufacturing, Information technology, Photomasks, Semiconducting wafers, Process modeling, Standards development

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Polarization, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Tolerancing

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Thin films, Lithography, Diffraction, Data modeling, Waveguides, Near field, Transmittance, Photomasks, Semiconducting wafers, Phase shifts

Showing 5 of 24 publications
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