Takashi Suganuma
at Gigaphoton Inc
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Semiconductors, Mirrors, Light sources, Carbon dioxide lasers, Magnetism, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Magnetic semiconductors, Tin

Proceedings Article | 13 January 2017 Paper
Proc. SPIE. 10254, XXI International Symposium on High Power Laser Systems and Applications 2016
KEYWORDS: Optical amplifiers, Oscillators, Laser applications, Carbon dioxide lasers, Quantum cascade lasers, Semiconductor lasers, Gas lasers, Extreme ultraviolet, Carbon monoxide, Pulsed laser operation

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Light sources, Oscillators, High power lasers, Carbon dioxide lasers, Amplifiers, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Laser systems engineering

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Thermography, Mirrors, Light sources, Carbon dioxide lasers, Distortion, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Laser systems engineering

Proceedings Article | 7 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Mirrors, Light sources, Carbon dioxide lasers, Magnetism, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma systems, Plasma, Laser systems engineering, Tin

Showing 5 of 31 publications
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