Dr. Takashi Sugiyama
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, X-rays, Extreme ultraviolet lithography, Microscopes, X-ray optics, Sensors, Glasses, X-ray imaging

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Particles, Photomasks, Aluminum, Contamination, Extreme ultraviolet, Chromium, Electrodes, Silicon, Iron, Particle contamination

Proceedings Article | 21 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Etching, Photomasks, Extreme ultraviolet lithography, Ion beams, Extreme ultraviolet, Manufacturing, Particles, Inspection, Ions, Deposition processes

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Multilayers, Reflectivity, Coating, Extreme ultraviolet, Glasses, Polishing, Particles, Surface roughness

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top