6-mirror-system EUV projection optics design with NA of 0.4 plus was improved and the residual wavefront error was
much reduced. Apodization is an issue for such high-NA EUV projection optics. Broad-band multilayer mirror can solve
the problem. Broad-band multilayer mirrors were developed. Measured reflectivity performance of these multilayers was
in good agreement with the designed performance. We have decided the measures to control contaminations of optics in
HVM EUV exposure tools.
Contamination control of optics is one of critical issues for extreme ultraviolet (EUV) lithography. EUV irradiation
under a carbon-containing environment causes carbon contaminations on mirror surfaces. We investigated irradiance
dependency of contaminating rates of some contaminants using a synchrotron radiation of Saga Light Source (SAGALS).
Decane's contaminating rate increased proportionally with irradiance, while perfluorohexane's contaminating rate
was almost constant at a higher irradiance than 10 mW/cm2. We then introduced a simple model: contamination reaction
occurs when photons are supplied onto contaminants which are supplied and adsorbed on mirrors, and the lesser of their
supplying rates determines the contaminating rate. At a lower irradiance, since contaminants are sufficiently supplied,
the photon supply determines the contaminating rate. At a higher irradiance, since photons are sufficiently supplied, the
contaminant supply determines the contaminating rate, which is independent of irradiance and depends on contaminant's
partial pressure. We also investigated irradiance dependency of cleaning rates of carbon contamination by oxidative gas
and incorporated it into the model. We applied the contamination/cleaning model to an existing exposure tool, EUV1.
The transmittance degradation history agreed well with the calculation.
Dedicate beam line for R&D on contamination of EUV exposure tools (BL18) was constructed at Saga Light Source
(SAGA-LS) and its operation has been started. BL18 has an advantage of long time exposure, which gives accurate data
compared with high-EUV-intensity and short-time experiments using an undulator beam line at New SUBARU synchrotron facility. Carbon contamination growth under low irradiance EUV radiation with fluorocarbon gas injection
was examined using Mo/Si multilayer mirror samples. In the EUV intensity region from 11 W/cm2 to 0.01 W/cm2,
degradation rate of reflectivity did not depend on the EUV intensity. The degradation rate was proportional to the EUV
intensity in the range of less than 0.01 W/cm2. Carbon contamination due to resist outgas during EUV exposure was also investigated.
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