Takashi Yasui
Engineer at Panasonic Corp
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Wafer-level optics, Semiconductors, Lithography, Metrology, Lithographic illumination, CCD cameras, Image quality, Photomasks, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Metrology, Deep ultraviolet, Interferometers, Quartz, Ultraviolet radiation, Transmittance, Photomasks, Charge-coupled devices, Phase measurement

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Reticles, Lithographic illumination, CCD cameras, Printing, Photomasks, Charge-coupled devices, Optical alignment, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, CCD cameras, Image quality, Vibration control, Optical resolution, Photomasks, Vacuum ultraviolet, CCD image sensors, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | December 27, 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Lithographic illumination, CCD cameras, Microelectronics, Photomasks, Vacuum ultraviolet, CCD image sensors, Binary data, Phase shifts

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