Mr. Takayoshi Abe Profile

Takayoshi Abe

at JSR Engineering Co Ltd

SPIE Involvement:

Author

Publications (2)

Proceedings Article | 26 March 2008 Paper

Sub-40-nm half-pitch double patterning with resist freezing process

Masafumi Hori, Tomoki Nagai, Atsushi Nakamura, Takayoshi Abe, Gouji Wakamatsu, Tomohiro Kakizawa, Yuusuke Anno, Makoto Sugiura, Shiro Kusumoto, Yoshikazu Yamaguchi, Tsutomu Shimokawa

Proceedings Volume 6923, 69230H (2008) https://doi.org/10.1117/12.772403

KEYWORDS: Double patterning technology, Critical dimension metrology, Lithography, Optical lithography, Photoresist processing, Immersion lithography, Scanning electron microscopy, Semiconducting wafers, Water, Etching

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Proceedings Article | 4 May 2005 Paper

Contact hole shrink process with novel chemical shrink materials

Takayoshi Abe, Tooru Kimura, Takashi Chiba, Motoyuki Shima, Shiro Kusumoto, Tsutomu Shimokawa

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598960

KEYWORDS: Photoresist materials, Etching, Chemical reactions, 193nm lithography, Image processing, Photoresist developing, Polymers, Lithography, Process control, Photoresist processing

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