Mr. Takayoshi Abe
at JSR Engineering Co Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Optical lithography, Etching, Water, Scanning electron microscopy, Double patterning technology, Immersion lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Etching, Polymers, Image processing, Photoresist materials, Process control, Chemical reactions, Photoresist processing, Photoresist developing, 193nm lithography

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