Mr. Takayoshi Niiyama Profile

Takayoshi Niiyama

Professor at Nagaoka Univ of Technology

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 29 March 2006 Paper

Adhesion and removal of micro bubbles for immersion lithography

Akira Kawai, Takayoshi Niiyama, Hotaka Endo, Masaki Yamanaka, Atsushi Ishikawa, Kenta Suzuki, Osamu Tamada, Masakazu Sanada

Proceedings Volume 6153, 61531S (2006) https://doi.org/10.1117/12.655444

KEYWORDS: Atomic force microscopy, Silicon, Niobium, Interfaces, Particles, Excimers, Liquids, Stereolithography, Immersion lithography, Solids

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Proceedings Article | 29 March 2006 Paper

Analysis of the effect of mechanical strength of the resist film on pattern collapse behavior using atomic force microscope

Osamu Tamada, Tomohiro Goto, Masakazu Sanada, Takahiro Moriuchi, Takayoshi Niiyama, Akira Kawai

Proceedings Volume 6153, 61533P (2006) https://doi.org/10.1117/12.651999

KEYWORDS: Refractive index, Photoresist processing, Temperature metrology, Atomic force microscope, Atomic force microscopy, Ellipsometry, Semiconducting wafers, Scanning electron microscopy, Head-mounted displays, Semiconductor manufacturing

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Proceedings Article | 29 March 2006 Paper

Solid defects condensation during watermark formation for immersion lithography

Takayoshi Niiyama, Akira Kawai, Simpei Hori, Masahiko Harumoto, Osamu Tamada, Masakazu Sanada

Proceedings Volume 6153, 61531U (2006) https://doi.org/10.1117/12.655420

KEYWORDS: Digital watermarking, Particles, Silicon, Liquids, Immersion lithography, Solids, Thermodynamics, Liquid lenses, Convection, Interfaces

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Proceedings Article | 4 May 2005 Paper

Mechanical strength of resist film analyzed by tip indentation method

Osamu Tamada, Masakazu Sanada, Atsushi Ishikawa, Takayoshi Niiyama, Akira Kawai

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599195

KEYWORDS: Refractive index, Atomic force microscopy, Polymers, Photoresist processing, Polymer thin films, Semiconducting wafers, Image processing, Temperature metrology, Ellipsometry, Atomic force microscope

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Proceedings Article | 4 May 2005 Paper

Adhesion and removal behavior of nanoscale bubble on resist film surface for immersion lithography

Akira Kawai, Atsushi Ishikawa, Takayoshi Niiyama, Masahiko Harumoto, Osamu Tamada, Masakazu Sanada

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599157

KEYWORDS: Atomic force microscopy, Immersion lithography, Copper, Excimers, Interfaces, Liquids, Stereolithography, Atomic force microscope, Photography, Photoresist processing

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