Takayoshi Niiyama
Professor at Nagaoka Univ of Technology
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Particles, Interfaces, Silicon, Atomic force microscopy, Solids, Excimers, Immersion lithography, Niobium, Stereolithography, Liquids

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Particles, Interfaces, Silicon, Digital watermarking, Solids, Immersion lithography, Convection, Liquid lenses, Thermodynamics, Liquids

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Ellipsometry, Refractive index, Atomic force microscopy, Scanning electron microscopy, Atomic force microscope, Semiconductor manufacturing, Head-mounted displays, Photoresist processing, Semiconducting wafers, Temperature metrology

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Ellipsometry, Refractive index, Polymers, Image processing, Atomic force microscopy, Atomic force microscope, Photoresist processing, Semiconducting wafers, Polymer thin films, Temperature metrology

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Copper, Interfaces, Photography, Atomic force microscopy, Atomic force microscope, Excimers, Immersion lithography, Photoresist processing, Stereolithography, Liquids

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