Takayuki Hasegawa
Manager at Canon Inc
SPIE Involvement:
Author
Publications (12)

SPIE Journal Paper | January 1, 2011
JEI Vol. 20 Issue 1
KEYWORDS: Bidirectional reflectance transmission function, Light sources, Cameras, Sensors, Reflection, Specular reflections, Light sources and illumination, Photography, Optimization (mathematics), Reflectivity

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Carbon, Mirrors, Polishing, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology, Protactinium

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Carbon, Contamination, Particles, Reflectivity, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Laser damage threshold, Oxidation

PROCEEDINGS ARTICLE | March 21, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Mirrors, Interferometers, Wavefronts, Optical testing, Projection systems, Extreme ultraviolet, Optics manufacturing, EUV optics, Wavefront metrology, Diffusion tensor imaging

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Diffraction, Mirrors, Wavefronts, Optical testing, CCD cameras, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Diffraction gratings

PROCEEDINGS ARTICLE | September 17, 2005
Proc. SPIE. 5921, Advances in Metrology for X-Ray and EUV Optics
KEYWORDS: Diffraction, Metrology, Interferometers, Wavefronts, Optical testing, Extreme ultraviolet, Charge-coupled devices, EUV optics, Shearing interferometers, Diffusion tensor imaging

Showing 5 of 12 publications
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