Takayuki Uchiyama
Director, Lithography
SPIE Involvement:
Profile Summary

Research and development of lithography for semiconductor
Experience includes the production engineering of Lithography process and the development of i-line, KrF, ArF, ArF immersion, EB, EUV lithography at IDM (Integrated Device Manufacturer)
The chairman of lithography team in Japan of ITRS from 2009 to 2012.
A pioneer in terms of ArF immersion lithography and SMO (source mask co-optimization)
Publications (25)

SPIE Journal Paper | 13 September 2019
Susumu Iida, Takamitsu Nagai, Takayuki Uchiyama
JM3, Vol. 18, Issue 03, 033503, (September 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.3.033503

SPIE Journal Paper | 19 June 2019
Susumu Iida, Takamitsu Nagai, Takayuki Uchiyama
JM3, Vol. 18, Issue 02, 023505, (June 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.023505
KEYWORDS: Semiconducting wafers, Palladium, Inspection, Standards development, Scanning electron microscopy, Etching, Lithography, Defect detection, Electron beam lithography, Silicon

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 109571C (2019) https://doi.org/10.1117/12.2515273
KEYWORDS: Photomasks, Extreme ultraviolet, Tantalum, Semiconducting wafers, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Lithographic illumination, Line width roughness, Line edge roughness

Proceedings Article | 26 March 2019 Paper
Susumu Iida, Takamitsu Nagai, Takayuki Uchiyama
Proceedings Volume 10959, 109590J (2019) https://doi.org/10.1117/12.2514897
KEYWORDS: Metrology, Semiconducting wafers, Inspection, Silicon, Scanning electron microscopy, Etching, Line edge roughness, Standards development, Defect detection, Lithography

Proceedings Article | 20 April 2011 Paper
Proceedings Volume 7971, 79711P (2011) https://doi.org/10.1117/12.879589
KEYWORDS: Etching, Lithography, Critical dimension metrology, Semiconducting wafers, Logic devices, Spatial resolution, Cadmium, Optical lithography, Resistance, Process control

Showing 5 of 25 publications
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