Takayuki Uchiyama
Chief Specialist at Toshiba Memory
SPIE Involvement:
Author
Profile Summary

Research and development of advanced lithography
Experience includes the production engineering of Lithography process and the development of i-line, KrF, ArF and ArF immersion lithography
The chairman of lithography team in Japan of ITRS from 2009 to 2012.
A pioneer in terms of ArF immersion lithography and SMO (source mask co-optimization)
Publications (23)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Defect detection, Etching, Silicon, Inspection, Scanning electron microscopy, Line edge roughness, Semiconducting wafers, Standards development

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Lithographic illumination, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Tantalum, Semiconducting wafers

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Optical lithography, Cadmium, Etching, Resistance, Process control, Logic devices, Spatial resolution, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 29 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Data modeling, Remote sensing, Error analysis, Inspection, Photomasks, Source mask optimization, SRAF, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 31 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Electronics, Scanners, Resistance, Immersion lithography, Logic devices, Thin film coatings, Photoresist processing, Semiconducting wafers, Yield improvement

Proceedings Article | 13 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffractive optical elements, Metals, Manufacturing, Electroluminescence, Photomasks, Logic devices, Source mask optimization, SRAF, Fiber optic illuminators

Showing 5 of 23 publications
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